Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol-ene Click Chemistry.

graphical abstract
Campos, L.M.; Meinel, I.; Guino, R.G.; Schierhorn, M.; Gupta, N.; Stucky, G.D.; Hawker, C.J.;
Adv. Mater.,
20, 3728-3733 .

As easy as “shake and bake”, the mixing and photocuring of poly-functional thiols with alkene-functional cross-linkers, via thiol-ene click chemistry, leads to materials with outstanding and tunable characteristics for soft imprint lithography. The materials are cured within 2 minutes at ambient conditions allowing stamps with high aspect ratio and sub-100 nm features to be fabricated.