Engineering Surfaces through Sequential Stop-Flow Photopatterning

Christian W. Pester, Benjaporn Narupai, Kaila M. Mattson, David P. Bothman, Daniel Klinger, Kenneth W. Lee, Emre H. Discekici, Craig J. Hawker
Adv. Mater.,
28, 9292–9300

Solution-exchange lithography is a new modular approach to engineer surfaces via sequential photopatterning. An array of lenses reduces features on an inkjet-printed photomask and reproduces arbitrarily complex patterns onto surfaces. In situ exchange of solutions allows successive photochemical reactions without moving the substrate and affords access to hierarchically patterned substrates.