Effects of Modulus and Surface Chemistry of Thiol-Ene Photopolymers in Nanoimprinting.

graphical abstract
Hagberg, E.C.; Malkoch, M.; Ling, Y.B.; Hawker, C.J.; Carter, K.R.
7, 233-237.

Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol and ene monomer mixtures were used, and after molding, patterned thiol-ene polymer features the size and shape of the original molds were replicated. Adhesion and release were examined and controlled by manipulating the surface chemistry of the substrate and mold. A direct correlation between cured thiol-ene polymer modulus and pattern fidelity was observed.