Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns.

Bang, J.; Jeong, U.; Ryu, D.Y.; Russell, T.P.; Hawker, C.J.;
Adv. Mater.,
21, 4769-4792.

The self-asembly of block copolymers is a promising platform for the “bottom-up” fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.