Applications of Photocurable PMMS Thiol-Ene Stamps in Soft Lithography.

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Campos, L.M.;Truong, T.T.; Shim, D.E.; Dimitrou, M.D.; Shir, D.; Meinel, I.; Gerbec, J.A.; Hahn, H.T.; Rogers, J.A.; Hawker, C. J.
Chem. Mater.
21, 5319-5326.

We report the performance and characterization of a material based on poly[(3-mercaptopropyl)methylsiloxane] (PMMS) in various soft lithography applications. PMMS stamps were made by cross-linking with triallyl cyanurate and ethoxylated (4) bisphenol A dimethacrylate via thiol−ene mixed-mode chemistry. The surface chemistry of the materials was characterized by XPS when varied from hydrophilic through oxygen plasma treatment, to hydrophobic by exposure to a fluorinated trichlorosilane agent. The materials are transparent above 300 nm and thermally stable up to 225 °C, thus rendering them capable to be employed in step-and-flash imprint lithography, nanoimprint lithography, nanotransfer printing, and proximity-field nanopatterning. The successful pattern replication from the micrometer to sub-100 nm scale was demonstrated.