Se Gyu Jang
Se Gyu Jang was born in Seoul, South Korea. He obtained his bachelor’s degree from Hanyang University in Seoul where he studied Chemical Engineering. During undergraduate, he had started his military service in Korea Air Force from 1998 and finally was discharged as a sergeant in 2000. At graduation in 2003, he got a summa cum laude from Applied Chemical Engineering Department. Then, he decided to move to Korea Advanced institute in Science and Technology (KAIST) located in Deajon, South Korea for his Ph.D. degree. During his Ph.D. course under the supervision of Prof. Seung-Man Yang (http://msfl.kaist.ac.kr), he developed and improved colloidal lithography. He has intensively studied on the localized surface plasmon resonance (LSPR) and surface-enhanced Raman scattering (SERS) of patterned metal-nanostructures fabricated by colloidal lithography. In 2005, he received a scholarship from our government and worked with Ed. Kramer in University of California, Santa Barbara (UCSB) for a year. Under his supervision, he has learned synthesize of block copolymers by living polymerizations such as anionic polymerization and reversible addition-fragmentation chain transfer (RAFT). In 2008, he got a Ph.D. degree from Chemical and Biomolecular Engineering Department in KAIST. Then, he got a scholarship from the Korea Research Foundation again and came back to UCSB as a postdoc in order to broaden his knowledge and experience.
Colloidal lithography (CL), in which self-assembled colloids are used as masks for fabricating 2-D nanostructures, is a simple and cost-effective alternative lithographic tool of advanced lithographic techniques frequently employed in nanofabrication. A variety of patterns, ranging from several tens nanometers to several micrometers, have been successfully fabricated via selective etching or deposition of metals on bare or modified colloidal masks. We developed simple and cost-effective method for the creation of hexagonally ordered dimple and metal arrays using embedding of colloidal spheres into polymeric thin film.